JPH0522699B2 - - Google Patents
Info
- Publication number
- JPH0522699B2 JPH0522699B2 JP59196426A JP19642684A JPH0522699B2 JP H0522699 B2 JPH0522699 B2 JP H0522699B2 JP 59196426 A JP59196426 A JP 59196426A JP 19642684 A JP19642684 A JP 19642684A JP H0522699 B2 JPH0522699 B2 JP H0522699B2
- Authority
- JP
- Japan
- Prior art keywords
- acetylene
- bis
- cured
- ether group
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Indole Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59196426A JPS6176459A (ja) | 1984-09-19 | 1984-09-19 | アセチレン基含有イミド |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59196426A JPS6176459A (ja) | 1984-09-19 | 1984-09-19 | アセチレン基含有イミド |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6176459A JPS6176459A (ja) | 1986-04-18 |
JPH0522699B2 true JPH0522699B2 (en]) | 1993-03-30 |
Family
ID=16357645
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59196426A Granted JPS6176459A (ja) | 1984-09-19 | 1984-09-19 | アセチレン基含有イミド |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6176459A (en]) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4525131B2 (ja) * | 2004-03-29 | 2010-08-18 | 住友ベークライト株式会社 | エポキシ樹脂組成物およびそれを用いた半導体装置 |
JP2009046622A (ja) * | 2007-08-22 | 2009-03-05 | Fujifilm Corp | 膜形成用組成物、膜及び電子デバイス |
JP5965792B2 (ja) * | 2012-09-05 | 2016-08-10 | 三菱瓦斯化学株式会社 | 芳香族ポリカーボネート樹脂組成物および成形品 |
EP3514869B1 (en) * | 2017-08-23 | 2023-10-04 | UBE Corporation | Binder resin for electrodes, electrode mixture paste, electrode and method for producing electrode |
WO2019146378A1 (ja) * | 2018-01-23 | 2019-08-01 | Jsr株式会社 | レジスト下層膜形成用組成物、レジスト下層膜及びその形成方法並びにパターニングされた基板の製造方法 |
JP7308167B2 (ja) * | 2019-04-16 | 2023-07-13 | 信越化学工業株式会社 | 有機膜形成用材料、半導体装置製造用基板、有機膜の形成方法、パターン形成方法、及び有機膜形成用化合物 |
JP7308168B2 (ja) | 2019-04-16 | 2023-07-13 | 信越化学工業株式会社 | 有機膜形成用材料、半導体装置製造用基板、有機膜の形成方法、パターン形成方法、及び有機膜形成用化合物 |
-
1984
- 1984-09-19 JP JP59196426A patent/JPS6176459A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6176459A (ja) | 1986-04-18 |
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